US Patent Issued to FUJIKIN on May 20 for "Flow rate control device and flow rate control method wherein an internal command signal is generated by a combination of first order lag process and ramp process" (Japanese Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,306,647, issued on May 20, was assigned to FUJIKIN Inc. (Osaka, Japan).

"Flow rate control device and flow rate control method wherein an internal command signal is generated by a combination of first order lag process and ramp process" was invented by Katsuyuki Sugita (Osaka, Japan), Kouji Nishino (Osaka, Japan), Kaoru Hirata (Osaka, Japan), Shinya Ogawa (Osaka, Japan) and Keisuke Ideguchi (Osaka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A flow rate control device (8) includes a control valve (6) having a valve element and a piezoelectric element for moving the valve element, and an arithmetic processing circuit (7) for controlling an opera...