US Patent Issued to FUJIFILM on Sept. 23 for "Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,422,752, issued on Sept. 23, was assigned to FUJIFILM Corp. (Tokyo).

"Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device" was invented by Akihiro Kaneko (Shizuoka, Japan), Masafumi Kojima (Shizuoka, Japan), Minoru Uemura (Shizuoka, Japan), Akiyoshi Goto (Shizuoka, Japan) and Michihiro Shirakawa (Shizuoka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An actinic ray-sensitive or radiation-sensitive resin composition includes a resin and a compound that generates an acid upon irradiation with actinic rays or radiation, in which an A value determined by...