ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,454,405, issued on Oct. 28, was assigned to FUJIFILM Corp. (Tokyo).
"Chemical liquid and chemical liquid storage body" was invented by Tetsuya Kamimura (Haibara-gun, Japan), Satomi Takahashi (Haibara-gun, Japan), Tadashi Oomatsu (Haibara-gun, Japan) and Tetsuya Shimizu (Haibara-gun, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention provides a chemical liquid having excellent defect suppressing properties. The present invention further provides a chemical liquid storage body containing the chemical liquid. The chemical liquid of the present invention is a chemical liquid containing a compound other than an alkane and an alkene, a...