US Patent Issued to FUJIFILM on Oct. 21 for "Polishing liquid and chemical mechanical polishing method" (Japanese Inventor)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,448,541, issued on Oct. 21, was assigned to FUJIFILM Corp. (Tokyo).

"Polishing liquid and chemical mechanical polishing method" was invented by Tetsuya Kamimura (Shizuoka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A polishing liquid which reduces the occurrence of erosion and scratches on a surface to be polished of an object to be polished having a cobalt-containing film after polishing in a case where the polishing liquid is applied to CMP of the object to be polished is provided. In addition, a chemical mechanical polishing method using the above-mentioned polishing liquid is provided. The polishing liquid is a polishing liquid used for ch...