ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,441,965, issued on Oct. 14, was assigned to FUJIFILM Corp. (Tokyo).
"Treatment liquid and substrate washing method" was invented by Yasuo Sugishima (Shizuoka, Japan) and Atsushi Mizutani (Shizuoka, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "An object of the present invention is to provide a treatment liquid for a semiconductor device, which is excellent in removal performance for residues present on a substrate, and to provide a substrate washing method using the treatment liquid.The treatment liquid of the present invention is a treatment liquid for a semiconductor device, which includes water, a basic compound, hexylene glycol, and a compoun...