US Patent Issued to FUJIFILM on Oct. 14 for "Method for inspecting photosensitive composition and method for producing photosensitive composition" (Japanese Inventor)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,443,107, issued on Oct. 14, was assigned to FUJIFILM Corp. (Tokyo).

"Method for inspecting photosensitive composition and method for producing photosensitive composition" was invented by Naoya Iguchi (Haibara-gun, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided are a method for inspecting a photosensitive composition, the method being able to more accurately evaluate photosensitive compositions produced at different times and including the same materials, and a method for producing a photosensitive composition.The method for inspecting a photosensitive composition includes a first step of performing exposure treatment, heat treatment, and ...