ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,480,047, issued on Nov. 25, was assigned to FUJIFILM Corp. (Tokyo).
"Composition and method for treating substrate" was invented by Moe Narita (Shizuoka, Japan) and Atsushi Mizutani (Shizuoka, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A composition contains a periodic acid compound selected from the group consisting of a periodic acid and a salt thereof, an amine compound that is a specific compound represented by Formula (1) or a salt thereof, and water."
The patent was filed on May 26, 2022, under Application No. 17/825,722.
*For further information, including images, charts and tables, please visit: http://patft.uspto.gov/netacgi/nph-Par...