ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,480,072, issued on Nov. 25, was assigned to FUJIFILM Corp. (Tokyo).
"Cleaning fluid and cleaning method" was invented by Tetsuya Kamimura (Haibara-gun, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "An object of the present invention is to provide a cleaning liquid for a semiconductor substrate, which has excellent corrosion prevention performance for a metal-containing layer. In addition, another object of the present invention is to provide a method for cleaning a semiconductor substrate.The cleaning liquid of an embodiment of the present invention is a cleaning liquid for a semiconductor substrate that has been subjected to a chemical mechanica...