US Patent Issued to FUJIFILM on Nov. 18 for "Pre-wet liquid, resist film forming method, pattern forming method, and kit" (Japanese Inventor)

ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,474,636, issued on Nov. 18, was assigned to FUJIFILM Corp. (Tokyo).

"Pre-wet liquid, resist film forming method, pattern forming method, and kit" was invented by Satomi Takahashi (Shizuoka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The pre-wet liquid is provided. The pre-wet liquid has a surface tension of 29.0 mN/m or more, a viscosity of 1.8 cP or less, and a vapor pressure of 2.5 to 5.0 mmHg, in a case of consisting of a single solvent, the pre-wet liquid has an SP value of 25.0 MPa1/2 or less and does not have a benzene ring group, and in a case of consisting of a mixed solvent, the pre-wet liquid satisfies the requirement 1 in which is a...