ALEXANDRIA, Va., June 10 -- United States Patent no. 12,293,920, issued on May 6, was assigned to FUJIFILM Corp. (Tokyo).
"Structure manufacturing method" was invented by Tomokazu Umezawa (Kanagawa, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A structure is manufactured by forming a mask that has an opening pattern on a surface of a substrate, etching the surface of the substrate with the mask to form a recessed portion corresponding to the opening pattern of the mask, forming a thin film including aluminum on a bottom surface of the recessed portion in a state where the mask remains, treating the thin film including aluminum with hot water to change the thin film into a fine recessed and projected ...