ALEXANDRIA, Va., June 16 -- United States Patent no. 12,306,538, issued on May 20, was assigned to FUJIFILM Corp. (Tokyo).
"Treatment liquid and pattern forming method" was invented by Hideaki Tsubaki (Shizuoka, Japan), Toru Tsuchihashi (Shizuoka, Japan), Wataru Nihashi (Shizuoka, Japan) and Kei Yamamoto (Shizuoka, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "An object of the present invention is to provide a treatment liquid for patterning a resist film and a pattern forming method, each of which can simultaneously suppress the occurrence of pattern collapse in a resist L/S pattern and the occurrence of omission failure in a resist C/H pattern.The treatment liquid of the present invention is a treat...