US Patent Issued to FUJIFILM on March 18 for "Solution, solution storage body, actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and manufacturing method of semiconductor device" (Japanese Inventors)

ALEXANDRIA, Va., March 19 -- United States Patent no. 12,253,801, issued on March 18, was assigned to FUJIFILM Corp. (Tokyo).

"Solution, solution storage body, actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and manufacturing method of semiconductor device" was invented by Tetsuya Kamimura (Haibara-gun, Japan), Satomi Takahashi (Haibara-gun, Japan) and Yukihisa Kawada (Haibara-gun, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An object of the present invention is to provide a solution which is excellent in both the temporal stability of an organic solvent and the defect inhibition properties. Another object of the present invention is to provide a solution stor...