US Patent Issued to FUJIFILM on July 1 for "Filter device, purification device, chemical solution production method" (Japanese Inventors)

ALEXANDRIA, Va., July 3 -- United States Patent no. 12,343,681, issued on July 1, was assigned to FUJIFILM Corp. (Tokyo).

"Filter device, purification device, chemical solution production method" was invented by Tetsuya Kamimura (Shizuoka, Japan), Tadashi Omatsu (Shizuoka, Japan), Tetsuya Shimizu (Shizuoka, Japan) and Satomi Takahashi (Shizuoka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A filtering device is for obtaining a chemical liquid by purifying a liquid to be purified and has an inlet portion, an outlet portion, a filter A, a filter B different from the filter A, and a flow path extending from the inlet portion to the outlet portion, in which the filter A and the filter B are arranged in s...