US Patent Issued to FUJIFILM on Jan. 27 for "Actinic-ray-sensitive or radiation-sensitive resin composition, actinic-ray-sensitive or radiation-sensitive film, method for forming pattern, and method for producing electronic device" (Japanese Inventors)

ALEXANDRIA, Va., Jan. 28 -- United States Patent no. 12,535,734, issued on Jan. 27, was assigned to FUJIFILM Corp. (Tokyo).

"Actinic-ray-sensitive or radiation-sensitive resin composition, actinic-ray-sensitive or radiation-sensitive film, method for forming pattern, and method for producing electronic device" was invented by Taro Miyoshi (Shizuoka, Japan) and Eiji Fukuzaki (Shizuoka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin having a polarity that increases by an action of an acid, and (B) a compound that generates an acid upon irradiation with actinic rays or radiation, represe...