US Patent Issued to FUJIFILM on Dec. 30 for "Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, actinic ray-sensitive or radiation-sensitive resin composition for manufacturing photomask, and method for manufacturing photomask" (Japanese Inventors)

ALEXANDRIA, Va., Dec. 31 -- United States Patent no. 12,510,822, issued on Dec. 30, was assigned to FUJIFILM Corp. (Tokyo).

"Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, actinic ray-sensitive or radiation-sensitive resin composition for manufacturing photomask, and method for manufacturing photomask" was invented by Hideyuki Ishihara (Shizuoka, Japan), Toshiya Takahashi (Shizuoka, Japan), Taro Miyoshi (Shizuoka, Japan) and Eiji Fukuzaki (Shizuoka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An actinic ray-sensitive or radiation-sensitive resin composition containi...