US Patent Issued to FUJIFILM on Dec. 30 for "Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device" (Japanese Inventors)

ALEXANDRIA, Va., Dec. 31 -- United States Patent no. 12,510,824, issued on Dec. 30, was assigned to FUJIFILM Corp. (Tokyo).

"Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device" was invented by Naoya Hatakeyama (Haibara-gun, Japan), Yasunori Yonekuta (Haibara-gun, Japan), Takamitsu Tomiga (Haibara-gun, Japan), Kohei Higashi (Haibara-gun, Japan) and Fumihiro Yoshino (Haibara-gun, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An actinic ray-sensitive or radiation-sensitive resin composition contains (A) a resin having a polarity that increases by an action of an acid, (B)...