ALEXANDRIA, Va., June 5 -- United States Patent no. 12,276,915, issued on April 15, was assigned to FUJIFILM Corp. (Tokyo).
"Treatment liquid and treatment method" was invented by Tetsuya Kamimura (Haibara-gun, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "An object of the present invention is to provide a treatment liquid having excellent resist film removal performance and excellent residue removal performance. Another object of the present invention is to provide a treatment method. The treatment liquid of an embodiment of the present invention is a treatment liquid containing an alkali compound and a hydroxycarboxylic acid, in which abrasive particles are not substantially contained, and a content...