ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,448,568, issued on Oct. 21, was assigned to Fujifilm Electronic Materials U.S.A. Inc. (N. Kingstown, R.I.).
"Etching compositions" was invented by Dmitry Dinega (Mesa, Ariz.) and Thomas Dory (Gilbert, Ariz.).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure is directed to etching compositions that are useful for, e.g., selectively removing silicon from a semiconductor substrate as an intermediate step in a multistep semiconductor manufacturing process."
The patent was filed on Feb. 14, 2023, under Application No. 18/109,298.
*For further information, including images, charts and tables, please visit: http://patft.uspto.gov/netacgi/n...