ALEXANDRIA, Va., June 4 -- United States Patent no. 12,319,843, issued on June 3, was assigned to Fujifilm Electronic Materials U.S.A. Inc. (N. Kingstown, R.I.).
"Polishing compositions and methods of using the same" was invented by Qingmin Cheng (Mesa, Ariz.), Bin Hu (Chandler, Ariz.), Yannan Liang (Gilbert, Ariz.), Hyosang Lee (Chandler, Ariz.), Liqing Wen (Mesa, Ariz.), Yibin Zhang (Gilbert, Ariz.) and Abhudaya Mishra (Gilbert, Ariz.).
According to the abstract* released by the U.S. Patent & Trademark Office: "This disclosure relates to polishing compositions that include (1) at least one abrasive; (2) at least one organic acid or a salt thereof; (3) at least one first amine compound, the at least one first amine compound including an ...