US Patent Issued to Fujifilm Electronic Materials U.S.A. on July 29 for "Polishing compositions and methods of use thereof" (American, Taiwanese Inventors)

ALEXANDRIA, Va., July 30 -- United States Patent no. 12,371,589, issued on July 29, was assigned to Fujifilm Electronic Materials U.S.A. Inc. (N. Kingstown, R.I.).

"Polishing compositions and methods of use thereof" was invented by Ting-Kai Huang (Tainan, Taiwan), Tawei Lin (Chandler, Ariz.), Bin Hu (Chandler, Ariz.), Liqing Wen (Mesa, Ariz.) and Yannan Liang (Gilbert, Ariz.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A polishing composition, includes an abrasive; a pH adjuster; a barrier film removal rate enhancer; a low-k removal rate inhibitor; an azole-containing corrosion inhibitor; and a ruthenium removal rate enhancer. A method of polishing a substrate includes the steps of: applying the polishing ...