US Patent Issued to FUJIFILM Business Innovation on May 27 for "Coating device, coating method, and method for manufacturing photoconductor for suppressing occurrence of bubble defects in coated film" (Japanese Inventors)

ALEXANDRIA, Va., June 17 -- United States Patent no. 12,317,632, issued on May 27, was assigned to FUJIFILM Business Innovation Corp. (Tokyo).

"Coating device, coating method, and method for manufacturing photoconductor for suppressing occurrence of bubble defects in coated film" was invented by Akihiko Nakamura (Kanagawa, Japan) and Takaakira Sasaki (Kanagawa, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A coating device includes: a coating liquid holding part that is provided with an upper opening portion and a lower opening portion and holds a coating liquid, and in which a cylindrical body penetrates the upper opening portion and the lower opening portion, and the cylindrical body is relatively m...