ALEXANDRIA, Va., July 9 -- United States Patent no. 12,351,467, issued on July 8, was assigned to FUJIFILM Business Innovation Corp. (Tokyo).
"Silica particle and method for producing the same" was invented by Yuka Zenitani (Kanagawa, Japan), Koji Sasaki (Kanagawa, Japan), Sakae Takeuchi (Kanagawa, Japan), Yoshifumi Eri (Kanagawa, Japan) and Takahiro Mizuguchi (Kanagawa, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A silica particle includes: a quaternary ammonium salt, in which the following expressions are satisfied, 0.90less than equal toFBEFORE/FAFTERless than equal to1.10, and 5less than equal toFSINTERING/FBEFOREless than equal to20, in which FBEFORE represents a maximum frequency value of a po...