US Patent Issued to FUJIBO HOLDINGS on Nov. 25 for "Polishing pad" (Japanese Inventors)

ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,479,064, issued on Nov. 25, was assigned to FUJIBO HOLDINGS INC. (Tokyo).

"Polishing pad" was invented by Yoshihide Kawamura (Saijo, Japan), Teppei Tateno (Saijo, Japan), Ryuma Matsuoka (Saijo, Japan), Hiroshi Kurihara (Saijo, Japan), Satsuki Narushima (Saijo, Japan), Yamato Takamizawa (Saijo, Japan), Keisuke Ochi (Saijo, Japan) and Tetsuaki Kawasaki (Saijo, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A polishing pad contains: a polishing layer having a polishing surface for polishing a workpiece; and a cushion layer disposed on the side of the polishing layer opposite from the polishing surface. With regard to the ratio (tan Delta) of the stor...