US Patent Issued to Fujian Jinhua Integrated Circuit on May 20 for "Pattern layout and the forming method thereof" (Chinese Inventor)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,309,993, issued on May 20, was assigned to Fujian Jinhua Integrated Circuit Co. Ltd. (Quanzhou, China).

"Pattern layout and the forming method thereof" was invented by Yifei Yan (Quanzhou, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "The invention discloses a pattern layout of an active region and a forming method thereof. The feature of the present invention is that in the sub-pattern unit, an appropriate active area pattern is designed according to the bit line pitch (BLP) and the word line pitch (WLP), the active area pattern is a stepped pattern formed by connecting a plurality of rectangular patterns in series, and the active area pattern i...