US Patent Issued to Fujian Jinhua Integrated Circuit on July 29 for "Semiconductor structure and method of manufacturing the same" (Chinese Inventors)

ALEXANDRIA, Va., July 30 -- United States Patent no. 12,374,621, issued on July 29, was assigned to Fujian Jinhua Integrated Circuit Co. Ltd. (Quanzhou, China).

"Semiconductor structure and method of manufacturing the same" was invented by Yu-Cheng Tung (Quanzhou, China) and Janbo Zhang (Quanzhou, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor structure is provided in the present invention, including a substrate with multiple recesses and active areas, multiple bit lines spaced apart in a first direction on the cell region and extending in a second direction perpendicular to the first direction, and the bit line is electrically connected to an active area in the substrate through the re...