US Patent Issued to FUJIAN JING'AN OPTOELECTRONICS on Nov. 11 for "Blackened wafers and method for manufacturing the same, and wave filter device having the same" (Chinese Inventors)

ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,470,190, issued on Nov. 11, was assigned to FUJIAN JING'AN OPTOELECTRONICS Co. LTD. (Quanzhou, China).

"Blackened wafers and method for manufacturing the same, and wave filter device having the same" was invented by Yilin Liu (Quanzhou, China), Zhonghe Lin (Quanzhou, China), Yenfu Lin (Quanzhou, China), Shihwei Huang (Quanzhou, China), Minghui Fang (Quanzhou, China) and Shengyu Yang (Quanzhou, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for blackening at least one wafer includes: (a) performing a reduction treatment on the at least one wafer; and (b) illuminating the at least one wafer with an ultraviolet light. The at least one wafer ...