ALEXANDRIA, Va., Sept. 10 -- United States Patent no. 12,414,280, issued on Sept. 9, was assigned to FUJI Corp. (Chiryu, Japan).
"Substrate working machine" was invented by Noriaki Iwaki (Hekinan, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a substrate working machine including a holding device configured to hold a substrate in which multiple through-holes are formed, an inserting device configured to insert multiple terminals of a component into the multiple through-holes of the substrate held by the holding device, and an imaging device configured to simultaneously image a shape of a pair of pins and a pair of through-holes of the multiple through-holes, in which positions of the pair ...