US Patent Issued to FUJI on Feb. 10 for "Foreign material removal system" (Japanese Inventor)

ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,544,798, issued on Feb. 10, was assigned to FUJI Corp. (Chiryu, Japan).

"Foreign material removal system" was invented by Hironori Kondo (Nagoya, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A foreign material removal system includes a conveyance device to convey a waste material, in which a target object and a foreign material are mixed, in a conveyance direction, a foreign material detection device to detect the foreign material, and a foreign material removal device to pick up the foreign material, carry the foreign material to a predetermined disposal place, and discard the foreign material. In the foreign material removal system, the foreig...