US Patent Issued to FUJI on April 8 for "Foreign matter removal system" (Japanese Inventor)

ALEXANDRIA, Va., April 9 -- United States Patent no. 12,269,066, issued on April 8, was assigned to FUJI Corp. (Chiryu, Japan).

"Foreign matter removal system" was invented by Hironori Kondo (Nagoya, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A foreign matter removal system of the present disclosure includes a conveyance device configured to convey a waste material in which a target object and a foreign matter are mixed, a detecting module configured to detect the foreign matter contained in the waste material, and a foreign matter removal module provided downstream of the detecting module in a conveyance direction of the conveyance device, the foreign matter removal module being configured to remo...