US Patent Issued to FUJI ELECTRIC on May 6 for "Semiconductor apparatus and manufacturing method of semiconductor apparatus" (Japanese Inventors)

ALEXANDRIA, Va., June 10 -- United States Patent no. 12,294,025, issued on May 6, was assigned to FUJI ELECTRIC Co. LTD. (Kanagawa, Japan).

"Semiconductor apparatus and manufacturing method of semiconductor apparatus" was invented by Motoyoshi Kubouchi (Matsumoto, Japan) and Takashi Yoshimura (Matsumoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A region for adjusting a carrier lifetime is easily formed by a method in which damage to a predetermined surface of a semiconductor substrate is small. Provided is a semiconductor apparatus including: a semiconductor substrate having an upper surface and a lower surface; a first region provided in a region on an upper surface side of the semiconductor sub...