US Patent Issued to Forge Nano on Jan. 27 for "Atomic layer deposition (ALD) for multi-layer ceramic capacitors (MLCCs)" (Colorado Inventors)

ALEXANDRIA, Va., Jan. 28 -- United States Patent no. 12,533,726, issued on Jan. 27, was assigned to Forge Nano Inc. (Thornton, Colo.).

"Atomic layer deposition (ALD) for multi-layer ceramic capacitors (MLCCs)" was invented by Daniel Higgs (Longmont, Colo.), Chris Gump (Thornton, Colo.), Karen Buechler (Westminster, Colo.), Jennette Warner (Thornton, Colo.), Paul Nelson (Thornton, Colo.), David M. King (Thornton, Colo.), Arrelaine Dameron (Thornton, Colo.) and James Trevey (Thornton, Colo.).

According to the abstract* released by the U.S. Patent & Trademark Office: "The use of Atomic Layer Deposition (ALD) and Molecular Layer Deposition (MLD) applied to powders and intermediates of the MLCC fabrication process can provide significant advan...