US Patent Issued to Forge Nano on Dec. 9 for "Continuous spatial atomic layer deposition process and apparatus for applying films on particles" (Colorado Inventors)

ALEXANDRIA, Va., Dec. 9 -- United States Patent no. 12,492,474, issued on Dec. 9, was assigned to Forge Nano Inc. (Thornton, Colo.).

"Continuous spatial atomic layer deposition process and apparatus for applying films on particles" was invented by Joseph Allen Spencer II (Longmont, Colo.) and Robert A. Hall (Denver).

According to the abstract* released by the U.S. Patent & Trademark Office: "Continuous spatial atomic layer deposition is performed on a particulate substrate in a continuous reactor comprising a plurality of spatially separated, precursor dosing zones and a means for moving the particulate substrate spatially through the precursor dosing zones to apply an atomic layer deposition coating thereon. The precursor dosing zones ma...