ALEXANDRIA, Va., June 17 -- United States Patent no. 12,315,694, issued on May 27, was assigned to FOCUS-EBEAM TECHNOLOGY (BEIJING) Co. LTD. (Beijing).
"Electron beam system" was invented by Shuai Li (Beijing).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is an electron beam system, including: an electron source, configured to generate an electron beam; a first beam guide, configured to accelerate the electron beam; a second beam guide, configured to accelerate the electron beam; a first control electrode arranged between the first beam guide and the second beam guide, configured to change movement directions of backscattered electrons and secondary electrons generated by the electron beam acting on...