ALEXANDRIA, Va., June 12 -- United States Patent no. 12,299,925, issued on May 13, was assigned to FNV IP B.V. (Leidschendam, Netherlands).
"Method and system for locating a light source" was invented by Arnoud Marc Jongsma (Vijfhuizen, Netherlands) and Joachim Ulrich Seibert (Leidschendam, Netherlands).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method and system for locating a high-intensity target light source (26) from an elevated observation location (Po), for instance in an aircraft. The target light source is located at/near an earth surface portion (30) and amongst reference light sources (16, 24, 25) arranged along the surface portion. This target light source emits light (28) with a peak radian...