US Patent Issued to FEI on Sept. 30 for "Modular ultra-high vacuum electron microscope" (Dutch Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,431,320, issued on Sept. 30, was assigned to FEI Co. (Hillsboro, Ore.).

"Modular ultra-high vacuum electron microscope" was invented by Rudolf Geurink (Eindhoven, Netherlands) and Hugo Cornelis Van Leeuwen (Eindhoven, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "A modular ultra-high vacuum (UHV) electron microscope for investigating a sample, according to the present disclosure includes a UHV chamber configured to reach and maintain an ultra-high vacuum within the UHV chamber, a UHV stage to hold the sample being investigated, a charged particle source configured to emit an electron beam toward the sample, and an optical column configured...