ALEXANDRIA, Va., July 16 -- United States Patent no. 12,362,132, issued on July 15, was assigned to FEI Co. (Hillsboro, Ore.).
"Simple spherical aberration corrector for SEM" was invented by Alexander Henstra (Utrecht, Netherlands) and Ali Mohammadi-Gheidari (Best, Netherlands).
According to the abstract* released by the U.S. Patent & Trademark Office: "Optical corrector modules for charged particle columns can include at least one split multipole that includes two multipoles separated by a distance less than 10 mm. Each of the individual multipoles may include at least two electrodes positioned to partially define a beam path through the multipole. Each of the electrodes can include a first surface that faces upstream of a charged partic...