ALEXANDRIA, Va., July 3 -- United States Patent no. 12,347,083, issued on July 1, was assigned to FEI Co. (Hillsboro, Ore.).
"Area selection in charged particle microscope imaging" was invented by Yuchen Deng (Eindhoven, Netherlands), Holger Kohr (Eindhoven, Netherlands) and Maurice Peemen (Eindhoven, Netherlands).
According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed herein are apparatuses, systems, methods, and computer-readable media relating to area selection in charged particle microscope (CPM) imaging. For example, in some embodiments, a CPM support apparatus may include: first logic to generate a first data set associated with an area of a specimen by processing data from a first imaging round of the...