ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,525,420, issued on Jan. 13, was assigned to FEI Co. (Hillsboro, Ore.).
"Charged particle beam source" was invented by Kun Liu (Portland, Ore.) and Steven J. Randolph (Portland, Ore.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A charged particle beam source, such as for use in an electron microscope, can include a mounting member defining a first opening at a free end of the mounting member and a bore extending from the first opening into the mounting member along a longitudinal axis of the mounting member. A second opening can be defined in a side wall of the mounting member and can extend between an outer surface of the mounting member and the bore,...