ALEXANDRIA, Va., Dec. 31 -- United States Patent no. 12,512,293, issued on Dec. 30, was assigned to FEI Co. (Hillsboro, Ore.).
"Reduction of image drift in a microscopy system" was invented by Nick Van Gestel (Eindhoven, Netherlands), Nick Verwimp (Eindhoven, Netherlands) and Ruud Krijnen (Eindhoven, Netherlands).
According to the abstract* released by the U.S. Patent & Trademark Office: "The invention relates to a sample holder for a microscopy system comprising a material with a low thermal conductivity for reducing a drift of the sample holder when inserted into a microscope. The invention also relates to a cold trap for a microscopy system comprising a sample holder, wherein the cold trap comprises a coating with a high thermal emissi...