US Patent Issued to FACET TECHNOLOGIES on Oct. 7 for "Lancet needle with alignment and retention notch" (Massachusetts Inventor)

ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,433,519, issued on Oct. 7, was assigned to FACET TECHNOLOGIES LLC (Atlanta).

"Lancet needle with alignment and retention notch" was invented by Kevin J. Seifert (Concord, Mass.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A lancet needle with an alignment and engagement notch, with material of the lancet body extending into the notch to more securely retain the needle to the lancet body, whereby a shorter needle can be utilized than with typical lancets. The notch optionally also provides a registration point for rotational and/or axial alignment of the needle during overmolding to form the lancet body, for example to maintain consistent positioning of...