ALEXANDRIA, Va., Jan. 20 -- United States Patent no. 12,532,712, issued on Jan. 20, was assigned to Exaktis Corp. (Coppell, Texas).
"Mask for X-ray lithography and metrology" was invented by Anne Sakdinawat (Coppell, Texas) and Yanwei Liu (Danville, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A mask apparatus for x-ray lithography and metrology where the x-ray absorber material is embedded in diamond and then covered with a thermally conductive material to provide requisite thermal conductivity when irradiated with x-rays. The apparatus then includes a hollow holder that is thermally interfaced with the mask and may also include means for external thermal control. The mask apparatus allows for tran...