US Patent Issued to EWHA UNIVERSITY-INDUSTRY COLLABORATION FOUNDATION on Oct. 28 for "Sensitive conjugated polymer structure color and sensor using same" (South Korean Inventors)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,454,601, issued on Oct. 28, was assigned to EWHA UNIVERSITY-INDUSTRY COLLABORATION FOUNDATION (Seoul, South Korea).

"Sensitive conjugated polymer structure color and sensor using same" was invented by So-Jung Park (Seoul, South Korea), Jerome Kartham Hyun (Seoul, South Korea), Ji-Eun Park (Seoul, South Korea) and Cheon Woo Moon (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure relates to a responsive polymer film, a method of preparing the responsive polymer film, and a sensor using the polymer film."

The patent was filed on Nov. 30, 2022, under Application No. 18/060,009.

*For further information, including ima...