US Patent Issued to EVATEC on Dec. 9 for "Measuring device and method for measuring parameters of a piezoelectric crystal onto which a thin film of material is deposited as well as thin-film deposition systems with such a device and a method for controlling such systems" (Swiss Inventors)

ALEXANDRIA, Va., Dec. 9 -- United States Patent no. 12,493,016, issued on Dec. 9, was assigned to EVATEC AG (Trubbach, Switzerland).

"Measuring device and method for measuring parameters of a piezoelectric crystal onto which a thin film of material is deposited as well as thin-film deposition systems with such a device and a method for controlling such systems" was invented by Peter Horn (Mels, Switzerland), Edmund Schungel (Buchs, Switzerland) and Adrian Herde (Hombrechtikon, Switzerland).

According to the abstract* released by the U.S. Patent & Trademark Office: "A measuring device for measuring parameters of a piezoelectric crystal onto which a thin film of material is deposited (under vacuum). The crystal includes two spaced-apart ele...