ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,431,388, issued on Sept. 30, was assigned to Eugenus Inc. (San Jose, Calif.).
"Conformal titanium silicon nitride-based thin films and methods of forming same" was invented by Hae Young Kim (San Jose, Calif.), Hyunchol Cho (Milpitas, Calif.), Ajit Dhamdhere (San Jose, Calif.) and Bunsen B. Nie (Fremont, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "The disclosed technology generally relates to forming a titanium nitride-based thin films, and more particularly to a conformal and smooth titanium nitride-based thin films and methods of forming the same. In one aspect, a method of forming a diffusion barrier comprising TiSiN comprises exposing a se...