US Patent Issued to Eugenus on Oct. 14 for "Conformal titanium silicon nitride-based thin films and methods of forming same" (California Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,444,648, issued on Oct. 14, was assigned to Eugenus Inc. (San Jose, Calif.).

"Conformal titanium silicon nitride-based thin films and methods of forming same" was invented by Ajit Dhamdhere (San Jose, Calif.), Hae Young Kim (San Jose, Calif.), Hyunchol Cho (Milpitas, Calif.) and Bunsen B. Nie (Fremont, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "The disclosed technology generally relates to forming a titanium nitride-based thin films, and more particularly to a conformal and smooth titanium nitride-based thin films and methods of forming the same. In one aspect, a method comprises forming a diffusion barrier comprising TiSiN having a modulus e...