ALEXANDRIA, Va., June 6 -- United States Patent no. 12,283,486, issued on April 22, was assigned to Eugenus Inc. (San Jose, Calif.).
"Conformal and smooth titanium nitride layers and methods of forming the same" was invented by Hyunchol Cho (Milpitas, Calif.), Hae Young Kim (San Jose, Calif.) and Bunsen B. Nie (Fremont, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "The disclosed technology generally relates to forming a thin film comprising titanium nitride (TiN), and more particularly to forming by a cyclical vapor deposition process the thin film comprising (TiN). In one aspect, a method of forming a thin film comprising titanium nitride (TiN) by a cyclical vapor deposition process comprises formin...