US Patent Issued to Ethicon on Nov. 11 for "Antimicrobial topical skin closure compositions and systems" (New Jersey Inventor)

ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,465,577, issued on Nov. 11, was assigned to Ethicon Inc. (Raritan, N.J.).

"Antimicrobial topical skin closure compositions and systems" was invented by Duan Li Ou (Warren, N.J.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Novel compositions and systems for closure of wounds with antimicrobial effectiveness provide devices of improved flexibility and elasticity and are readily applied to wound sites or over wound closure devices. A novel platinum catalyst comprising platinum tetramethyldivinyl disiloxane diethyl maleate complex for use in such compositions provides for rapid curing on topical surfaces such as skin and bonds to such surfaces in about 2-...