US Patent Issued to Ethicon on Jan. 20 for "Antimicrobial anhydrous topical skin closure compositions and systems" (New Jersey, New York Inventors)

ALEXANDRIA, Va., Jan. 20 -- United States Patent no. 12,528,913, issued on Jan. 20, was assigned to Ethicon Inc. (Raritan, N.J.).

"Antimicrobial anhydrous topical skin closure compositions and systems" was invented by Duan Li Ou (Warren, N.J.), Leo Kriksunov (Ithaca, N.Y.) and Julian Quintero (Flemington, N.J.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Novel compositions and systems for closure of wounds with antimicrobial effectiveness are disclosed. The compositions provide devices of improved flexibility and elasticity and are readily applied to wound sites or over wound closure devices. The present invention is also directed to a novel platinum catalyst for use in such compositions. The catalyst prov...