US Patent Issued to ETAMAX on July 29 for "Defect classification equipment for silicon carbide substrate using single incident light-based photoluminescence and defect classification method using the same" (South Korean Inventors)

ALEXANDRIA, Va., July 30 -- United States Patent no. 12,372,469, issued on July 29, was assigned to ETAMAX Co. LTD (Suwon-si, South Korea).

"Defect classification equipment for silicon carbide substrate using single incident light-based photoluminescence and defect classification method using the same" was invented by Huyndon Jung (Yeongju-si, South Korea) and Min-jung Lee (Gunpo-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Stack fault inspection apparatus and method are disclosed. The apparatus includes a sample stage fixing the silicon carbide substrate and allow the incident light to scan the substrate surface; an incident light source configured to irradiate a vertical illumination ligh...