US Patent Issued to Essilor International on Jan. 20 for "Method for reducing near-infrared light exposure by a laminate film structure on an eyewear" (Massachusetts Inventors)

ALEXANDRIA, Va., Jan. 20 -- United States Patent no. 12,529,913, issued on Jan. 20, was assigned to Essilor International (Charenton-le-Pont, France).

"Method for reducing near-infrared light exposure by a laminate film structure on an eyewear" was invented by Haifeng Shan (Shrewsbury, Mass.) and Hao-Wen Chiu (Holden, Mass.).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure relates to a laminate film structure for a wearer, intended for reflecting and absorbing near-infrared light, comprising a near-infrared reflection layer reflecting the near-infrared light that is incident on the near-infrared reflection layer, and a near-infrared absorption layer disposed between an eye of the wearer a...